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- W1506675861 abstract "This paper reports on the development of a novel wet-release process for the fabrication of slender and compliant micro-mechanical structures with sub-micron gap spacing developed in an in-house CMOS compatible 8 pilot line. A Self Assembled Monolayer (SAM) of n-decyltrichlorosilane (DTS) is used as an anti-stiction material to realise suspended structures. Process characterisation includes studies on the DTS SAM, release of the polycrystalline Silicon and polycrystalline Silicon Germanium test structures. We have obtained work of adhesion values of 11 /spl mu/J/m/sup 2/ and 0.06 /spl mu/J/m/sup 2/, slenderness ratios of 218 and 1000, compliance of 12 m/N and 350 m/N, and contact angle of 126/spl deg/ and 129/spl deg/ for poly -Si and poly-SiGe cantilevers respectively. Our results compare favourably well with results from the literature." @default.
- W1506675861 created "2016-06-24" @default.
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- W1506675861 date "2003-06-25" @default.
- W1506675861 modified "2023-10-01" @default.
- W1506675861 title "A novel process for fabricating slender and compliant suspended poly-Si micro-mechanical structures with sub-micron gap spacing" @default.
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- W1506675861 doi "https://doi.org/10.1109/memsys.2002.984357" @default.
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