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- W150708105 abstract "Em- ail: iwshim@cau.ac.krRecevied June 3, 2005Key Words : ZnS, Zinc sulfide thin film Zi, nc dithoi carbamate, MOCVD, Buffer layer in soalr cellZnS, a group II-VI semiconductor having a large directband gap of 3.6 eV in near UV region and a refractive indexof 2.35, is well known to be an important device material,which can be used for detector, emitter, and modulator inoptoelectronics," @default.
- W150708105 created "2016-06-24" @default.
- W150708105 date "2005-10-20" @default.
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- W150708105 title "Preparation of ZnS Thin Film Using Zn(dithiocarbamate)<sub>2</sub>Precursors by MOCVD Method" @default.
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- W150708105 doi "https://doi.org/10.5012/bkcs.2005.26.10.1582" @default.
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