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- W1507723956 abstract "To obtain optimal results from plasma processing, the energy of ions incident on the substrate and their current or flux must be carefully monitored and controlled. Although several common diagnostic techniques can be used to measure ion current and ion energy, these techniques are usually not compatible with the processes and reactors used by industry. Methods have been proposed for determining ion properties from the applied rf current and voltage, which are easily measured in commercial reactors. However, such methods are often inaccurate because they rely on false or untested assumptions. Here, a new, more accurate method is presented which makes use of a complete model of the time-dependent ion dynamics in the plasma sheath. The model was validated by comparison to measurements for high-density discharges in an inductively coupled GEC Reference Cell. Measurements were performed for argon discharges at pressures of 1.33 Pa (10 mTorr) for inductive source powers up to 370 W, rf bias powers up to 150 W, and rf bias frequencies of 1 MHz to 10 MHz. Comparisons with previous techniques for monitoring ion current and ion energy show the improvement in accuracy obtained by the new technique." @default.
- W1507723956 created "2016-06-24" @default.
- W1507723956 creator A5038962192 @default.
- W1507723956 date "2001-01-01" @default.
- W1507723956 modified "2023-10-13" @default.
- W1507723956 title "Monitoring ion current and ion energy during plasma processing using radio-frequency current and voltage measurements" @default.
- W1507723956 doi "https://doi.org/10.1063/1.1354409" @default.
- W1507723956 hasPublicationYear "2001" @default.
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