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• W1509678066 abstract "The authors propose an internal-antenna configuration with multiple low-inductance antenna (LIA) units for production of large-scale high-density ICPs, providing low-voltage operation. Microcrystalline silicon films were grown on glass substrates using silane (SiH/sub 4/) and hydrogen (H/sub 2/) mixture plasmas at a substrate temperature below 773K. The deposited films showed the crystalline phase formation with Raman intensity ratio as high as 8. Relatively uniform distribution is achieved over the large-area substrate." @default.
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• W1509678066 date "2003-08-27" @default.
• W1509678066 modified "2023-09-26" @default.
• W1509678066 title "Development of large-scale inductively coupled plasma source with multiple internal antennas units for synthesis of microcrystalline silicon films" @default.
• W1509678066 doi "https://doi.org/10.1109/imnc.2002.1178624" @default.
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