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- W1516888926 abstract "我们学习了在非结晶的 LaAlO3 薄电影和 Si 底层之间的界面的反应，用高分辨率的传播电子显微镜学和 X 光光电子光谱学。它被显示出在 LaAlO3 之间的界面的层他和 Si 底层 isSiLaxAlyOx。La， Si 和艾尔化学药品状态的深度分布证明到界面的层的艾尔 2p 的 La4d (3/2 ) 的比率与 theLaAlO3 电影的相比与深度仍然保持未改变。而且，在界面的层的 Si 内容逐渐地与增加界面的层的厚度减少。当以前相信了，这些结果强烈建议艾尔元素不在界面的层是缺乏的，并且 SiLaxAlyOzinterfacial 层的形成在 LaAlO3 电影免职期间主要由于从底层的 Si 的散开。与界面的层形成的理解，能控制接口特征作为门电介质用 high-h 氧化物保证设备的需要的表演。" @default.
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- W1516888926 date "2006-01-01" @default.
- W1516888926 modified "2023-09-24" @default.
- W1516888926 title "Formation of Interfacial Layers in LaAlO3/Silicon during Film Deposition" @default.
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