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- W1519906821 abstract "Integrated 10 /spl mu/m thick poly-SiGe gyroscopes are processed on top of an 8 standard 0.35 /spl mu/m CMOS wafer with 5 metal levels by using an advanced plasma-enhanced chemical vapor deposition multi-layer technology. The gyroscopes are free-moving with Q-factors for the drive mode up to 10000 at the pressure of 0.8 mTorr while the CMOS chip is fully functional." @default.
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- W1519906821 date "2005-08-30" @default.
- W1519906821 modified "2023-10-02" @default.
- W1519906821 title "Processing of MEMS gyroscopes on top of CMOS ICs" @default.
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- W1519906821 doi "https://doi.org/10.1109/isscc.2005.1493882" @default.
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