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• W1520121273 abstract "We have grown GaAs layers by molecular beam epitaxy on Si(110) substrates with different tilted angles towards the [001] direction. The samples where characterized by atomic force microscopy (AFM), high resolution x-ray diffraction (HRXRD), and photoreflectance spectroscopy (PR). The surface morphology analysis by AFM showed that the surface roughness decreased as the off-angle increased. The dislocation density was obtained from the full width at half maximum of the HRXRD reflection peaks. By increasing the off-angle we observed a reduction in the dislocation density. The PR spectra showed the presence of oscillations above the band-gap energy value associated to built-in internal electric fields. The built-in electric field strength and the GaAs band-gap energy values were obtained by employing the Franz-Keldysh model. We obtained band-gap energy values that suggest the presence of residual strains in the films." @default.
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• W1520121273 date "2000-01-01" @default.
• W1520121273 modified "2023-09-27" @default.
• W1520121273 title "Influence of Si(110) misoriented substrates on the microstructure and photoreflectance ofGaAs thin films deposited by MBE" @default.
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