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• W152182235 abstract "Time-resolved Langmuir probe technique was used for determination of parameters of the hollow cathode plasma jet system used for plasma enhanced deposition of various thin lms. Plasma parameters, such as electron distribution, electron density, or eective electron temperature, were measured in continuous wave radio-frequency (RF), pulse-modulated RF, continuous direct current (DC), and pulsed DC mode of the plasma jet excitation. Further, measurements of ion current to the substrate during deposition are presented. A method using measurement of RF current and voltage on the substrate is used. A simple theory for determination of the ion part of the RF current to the substrate is described and its applicability to the hollow cathode plasma jet deposition system is discussed." @default.
• W152182235 created "2016-06-24" @default.
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• W152182235 date "2005-01-01" @default.
• W152182235 modified "2023-09-27" @default.
• W152182235 title "Measurement of Parameters of Low Temperature Technological Plasmas" @default.
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