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- W1523178170 abstract "Abstract The sections in this article are Introduction Plasma‐Enhanced Chemical Vapor Deposition Growth of Hydrogenated Amorphous Silicon Molecular Structure Chemical Bonding Localization of Electronic States Electronic Structure and Localized States Band Tail States Doping and Dopant States The Doping Efficiency Dopant States Native Defects and Defect States Microscopic Character of Defects Dependence of the Defect Concentration on Doping Distribution of Defect States Dependence of the Defect Concentration on Growth Conditions Surfaces and Interfaces Surface States Oxidation Interfaces Alloys Electronic Transport Electrical Conductivity, Thermopower and Hall Effect The Drift Mobility Defect Equilibrium and Metastability The Hydrogen Glass Model Thermal Equilibration of Electronic States The Defect Compensation Model of Doping The Weak Bond Model The Distribution of Gap States Defect Reaction Kinetics Stretched Exponential Decay Hydrogen Diffusion Metastability Defect Creation by Illumination Defect Creation by Bias and Current Devices and Applications Thin Film Transistors P ‐ i ‐ n Photodiodes and Solar Cells The Photodiode Electrical Characteristics Matrix Addressed Arrays Summary" @default.
- W1523178170 created "2016-06-24" @default.
- W1523178170 creator A5011193607 @default.
- W1523178170 creator A5034595841 @default.
- W1523178170 date "2013-02-15" @default.
- W1523178170 modified "2023-10-09" @default.
- W1523178170 title "Material Properties of Hydrogenated Amorphous Silicon" @default.
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