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• W152407867 abstract "Some effects of the sputtering parameters on the Capacitance-Voltage (C-V) characteristics of Ta 2 O 5 MIS capacitor and the leakage current of Ta 2 O 5 films fabricated by Ion beam sputtering are reported. The ESCA analysis is also carried out in order to investigate the atomic state in the films. It is concluded that Ta is deoxidized in the interface between Si and Ta 2 O 5 , while it doesn't affect the interface of Si for Ta 2 O 5 /SiO 2 /Si. In order to make a good MIS capacitor by IBS, the existence of SiO 2 in the interface between Ta 2 O 5 and Si is needed." @default.
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• W152407867 date "1994-01-01" @default.
• W152407867 modified "2023-09-23" @default.
• W152407867 title "Preparation of Tantalum Oxide thin films on Si substrate by ion beam sputtering" @default.
• W152407867 cites W1987911907 @default.
• W152407867 doi "https://doi.org/10.1016/b978-0-444-81994-9.50091-9" @default.
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