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• W1524339075 abstract "We have developed a perpendicular-anisotropy magnetic tunnel junction (p-MTJ) stack with CoFeB free layer and Co/Pt multilayer based synthetic ferrimagnetic (SyF) pinned layer that withstand annealing at a temperature up to 420°C (that compatible with CMOS BEOL process) by controlling boron diffusion. We demonstrated the 10 nmφ p-MTJ with double CoFeB/MgO interface tolerable against 400°C annealing which is a requisite building block for realization of high density spin transfer torque magnetic random access memory (STT-MRAM) in reduced dimensions." @default.
• W1524339075 created "2016-06-24" @default.
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• W1524339075 date "2015-06-01" @default.
• W1524339075 modified "2023-09-27" @default.
• W1524339075 title "10 nmphi perpendicular-anisotropy CoFeB-MgO magnetic tunnel junction with over 400°C high thermal tolerance by boron diffusion control" @default.
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• W1524339075 doi "https://doi.org/10.1109/vlsit.2015.7223661" @default.
• W1524339075 hasPublicationYear "2015" @default.
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