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- W1530893562 abstract "This chapter focuses on the measurement of critical dimensions (CD) for the semiconductor industry. First, it defines the critical parameters that must be controlled by the semiconductor industry in order to guarantee sufficient yield and process quality in device manufacturing. Next, it briefly introduces and defines the limitations of the two main production techniques [CD scanning electron microscope (CD-SEM) and scatterometry: optical CD measurement] that are currently used in production for CD process control. Then, the chapter introduces and discusses the interest of using scanning probe microscopy (SPM) for CD purpose in the semiconductor industry, originally developed in the 1990s to complement conventional techniques. Finally, the chapter presents a new concept of CD metrology, so-called hybrid metrology, which is supposed to integrate SPM technology into the global production process control schematic in order to push away the current limitations of conventional CD techniques." @default.
- W1530893562 created "2016-06-24" @default.
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- W1530893562 date "2013-11-08" @default.
- W1530893562 modified "2023-09-25" @default.
- W1530893562 title "Scanning Probe Microscopy for Critical Measurements in the Semiconductor Industry" @default.
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- W1530893562 doi "https://doi.org/10.1002/9781118723111.ch8" @default.
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