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- W1536112770 abstract "The ZnO:AI films were annealed at different atmosphere. The films annealed in vacuum showed perfect properties, compared with in air and Ar atmosphere, and the low resistivity of the order of 10 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>-3</sup> Omegaldrcm was obtained in the condition of vacuum annealing at 220degC." @default.
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- W1536112770 date "2007-10-01" @default.
- W1536112770 modified "2023-10-16" @default.
- W1536112770 title "The annealing process of R.F. magnetron sputtered ZnO:Al films" @default.
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- W1536112770 doi "https://doi.org/10.1109/aoe.2007.4410872" @default.
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