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- W1536533070 abstract "Abstract : The research involved investigation of process parameter growth environment film property relationships for various binary oxide and nitride films grown on unheated substrates by reactive sputter deposition using an elemental target. In situ optical emission spectroscopy and glow discharge mass spectrometry were used to determine gas phase species in the plasma volume. A battery of techniques were used to characterize (post-deposition) film crystallography, chemistry, microstructure, electrical resistivity, and optical behavior. Keywords: Sputter deposition, Glow discharges, Glow discharge diagnostics, Optical emission, Mass spectrometry, Aluminum oxide, Vanadium, Pentoxide, Gold oxide, Tungsten nitride, Aluminum nitride, Germanium dioxide." @default.
- W1536533070 created "2016-06-24" @default.
- W1536533070 creator A5020436041 @default.
- W1536533070 date "1988-02-01" @default.
- W1536533070 modified "2023-09-27" @default.
- W1536533070 title "Low Temperature Film Growth of the Oxides of Zinc, Aluminum, and Vanadium (and Related Systems, Oxides of Gold and Germanium, Nitrides of Aluminum and Tungsten) by Reactive Sputter Deposition." @default.
- W1536533070 hasPublicationYear "1988" @default.
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