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- W1539372221 abstract "High-K gate dielectrics have been under extensive investigation for use in sub-100nm MOSFET's to suppress gate leakage. However, thicker gate dielectrics can result in degradation of the electrical performance due to increased fringing fields from the gate to source/drain. In this paper the capacitance degradation resulting from this effect is analyzed & simple technique to model this effect is presented." @default.
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- W1539372221 date "1999-09-13" @default.
- W1539372221 modified "2023-09-22" @default.
- W1539372221 title "Capacitance Degradation due to Fringing Field in Deep Sub-Micron MOSFETs with High-K Gate Dielectrics" @default.
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