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- W1540039436 abstract "Si-rich SiO/sub 2/ films (SRO) and Er-doped, Si-rich SiO/sub 2/ films (EnSRO) were deposited by reactive RF magnetron co-sputtering followed by thermal annealing in a nitrogen atmosphere in order to investigate the optimum condition for efficient 1.54 /spl mu/m emission. Reference Er in stoichiometric SiO/sub 2/ (Er:SiO/sub 2/) films were deposited for comparison. The room temperature photoluminescence intensity of SRO films without Er was found to be maximized at 38 at% Si after annealing at 1100/spl deg/C for 1 hour. On the contrary, we found that the maximized Er photoluminescence of Er:SRO with 38 at% Si and an Er concentration of 10/sup 20/ cm/sup -3/ occurred for annealing temperatures between 600/spl deg/C and 800/spl deg/C. Under these conditions the 1.54 /spl mu/m Er emission is enhanced by more than two orders of magnitude relative to Er:SiO/sub 2/ samples while negligible SRO emission is observed." @default.
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- W1540039436 date "2005-10-18" @default.
- W1540039436 modified "2023-09-27" @default.
- W1540039436 title "Energy sensitization in erbium-doped silicon-rich oxide films annealed at low temperatures" @default.
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- W1540039436 doi "https://doi.org/10.1109/group4.2005.1516413" @default.
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