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- W1541002892 abstract "A new fabrication technique is used to produce quantum dots with read-out channels in silicon/silicon-germanium two-dimensional electron gases. The technique utilizes Schottky gates, placed on the sides of a shallow etched quantum dot, to control the electronic transport process. An adjacent quantum point contact gate is integrated to the side gates to define a read-out channel and thus allow for noninvasive detection of the electronic occupation of the quantum dot. Reproducible and stable Coulomb oscillations and the corresponding jumps in the read-out channel resistance are observed at low temperatures. The fabricated dot combined with the read-out channel represent a step towards the spin-based quantum bit in Si/SiGe heterostructures." @default.
- W1541002892 created "2016-06-24" @default.
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- W1541002892 date "2005-11-21" @default.
- W1541002892 modified "2023-09-27" @default.
- W1541002892 title "Fabrication and characterization of electrostatic Si∕SiGe quantum dots with an integrated read-out channel" @default.
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- W1541002892 doi "https://doi.org/10.1063/1.2136436" @default.
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