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- W1542823960 abstract "Selective-area epitaxy has been shown to be an effective way to produce a monolithic multiple-wavelength laser source suitable for wavelength division multiplexing (WDM). In general the channel outputs of multiple-wavelength laser arrays have a spatial separation that is large in comparison to the core diameter of a single mode fiber. Therefore, external coupling is required to combine the outputs into a single fiber. In this work, we report the fabrication of a dual-channel strained-layer, InGaAs-GaAs-AlGaAs quantum well WDM laser with integrated waveguide output coupler by an atmospheric pressure metal-organic chemical vapor deposition (MOCVD) three-step selective-area growth process." @default.
- W1542823960 created "2016-06-24" @default.
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- W1542823960 date "2002-12-17" @default.
- W1542823960 modified "2023-09-23" @default.
- W1542823960 title "Dual-channel strained-layer InGaAs-GaAs-AlGaAs WDM source with integrated coupler by selective-area MOCVD" @default.
- W1542823960 cites W2119133915 @default.
- W1542823960 cites W2150586541 @default.
- W1542823960 doi "https://doi.org/10.1109/leos.1994.586625" @default.
- W1542823960 hasPublicationYear "2002" @default.
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