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- W1546351710 abstract "Abstract We prepared RuO2 thin films on Si substrates by pulsed-laser deposition using a sintered oxide target, and investigated the crystallographic nature and the thermodynamic stability of the films in terms of the growth conditions: temperature and oxygen pressure. Faceted grains grew in a highly oxidizing atmosphere. The films grown at room temperature included a large quantity of oxygen ions in the Ru metal matrix. An oriented Ru metal film grew under a non-oxidizing atmosphere. The grain morphology was closely related to the oxygen pressure." @default.
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- W1546351710 date "2000-05-01" @default.
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- W1546351710 title "Growth of RuO2 thin films by pulsed-laser deposition" @default.
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- W1546351710 doi "https://doi.org/10.1016/s0040-6090(99)01111-6" @default.
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