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• W155070086 abstract "Cluster deposition allows the formation of abrupt, nearly-ideal metal–GaAs interfaces. This procedure produces large, fully-metallic clusters on the GaAs surface without any observable substrate disruption. Interfaces formed in this manner show intriguing EF evolution, that is, metal and coverage independent for n-GaAs but weakly dependent on the metal for p-GaAs. The Fermi level energies are quite distinct from those observed for interfaces formed by direct atom deposition for n-GaAs but coincide better for p-GaAs. The differences are related to loss of surface relaxation around the clusters and the creation of new bonding configurations involving the clusters. No evidence of MIGS or conventional defect levels is seen for preformed metal cluster deposition. The details of the Fermi level evolution are not completely understood at this time, but the abrupt disruption-free nature of the interfaces make them particularly attractive for metal-semiconductor junction modeling. Certainly, these results demonstrate the importance of the energetics associated with atom condensation and bond formation. Specifically, comparison of results for Ag clusters grown spontaneously on GaAs during 300 K atom deposition and those deposited with the cluster technique shows dramatically different band bending." @default.
• W155070086 created "2016-06-24" @default.
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• W155070086 date "1993-01-01" @default.
• W155070086 modified "2023-09-26" @default.
• W155070086 title "Cluster-Assembled Interfaces" @default.
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• W155070086 doi "https://doi.org/10.1016/b978-0-444-89022-1.50022-5" @default.
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