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- W1551100214 abstract "A SOI MOSFET with FINFET structure is simulated, I-V characteristics, electron distribution under gate, and quantum effect of inversion layer are investigated and compared with conventional single gate. Simulated results show the SOI devices present peformance superior to bulk silicon devices. The 3-dimensional effect of this device is also analyzed." @default.
- W1551100214 created "2016-06-24" @default.
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- W1551100214 date "2005-08-25" @default.
- W1551100214 modified "2023-09-28" @default.
- W1551100214 title "Simulation of 100nm SOI MOSFET with FINFET structure" @default.
- W1551100214 cites W2092028253 @default.
- W1551100214 doi "https://doi.org/10.1109/icsict.2001.982036" @default.
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