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- W1553818448 abstract "A fabrication technique for quantum point contacts (QPCs) in an InGaAs/InAlAs two-dimensional electron gas heterostructure is reported. The key challenge in realizing a well-behaved QPC is efficient electrostatic control of a one-dimensional channel using the gate electrode. The fabricated QPCs employ a 100-nm-wide mesa constriction and a gate electrode that wraps around the constriction for three-dimensional electric-field gating. In addition, conformal aluminum-oxide growth by atomic layer deposition is employed to suppress gate leakage while minimizing the interface state density. The wrap-gate QPCs show clear conductance steps, demonstrating well-defined quantized transverse modes in the InGaAs-based one-dimensional channel." @default.
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- W1553818448 date "2012-01-26" @default.
- W1553818448 modified "2023-09-25" @default.
- W1553818448 title "In$_{0.75}$Ga$_{0.25}$As Quantum Point Contacts Utilizing Wrap-Gate Geometry" @default.
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- W1553818448 doi "https://doi.org/10.1143/apex.5.024001" @default.
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