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- W1562387240 abstract "It has been found that GaAs MESFET gate breakdown voltages (BVGD) can be reduced by as much as 50% by deposition of stressed overlayer dielectric films. These films do not have to be in contact with the GaAs surface and do not measurably alter the electrical characteristics of the GaAs/dielectric interface. The effect is reversible, leading to the identification of the cause as being the piezoelectric fields induced in the underlying GaAs. The one-dimensional line load model typically used to calculate piezoelectric charge density tends to overestimate the effect. An improved distributed edge force model that provides a simple analytical solution and good quantitative agreement with experimental data is proposed. >" @default.
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- W1562387240 date "2002-12-09" @default.
- W1562387240 modified "2023-09-25" @default.
- W1562387240 title "Dielectric film stress influences on GaAs MESFET gate breakdown" @default.
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- W1562387240 doi "https://doi.org/10.1109/gaas.1991.172670" @default.
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