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- W1566149305 abstract "多晶的 Si (poly-Si ) 电影在诱导地联合的血浆化学药品蒸汽免职在象 350degrees C 一样低的温度在 Al 涂的玻璃底层上种的 situ。比作非结晶的 Si/Al-layerstructures 的传统的退火结晶化，没有层交换被观察，结果的 poly-Si 电影比 Allayer 厚得多。由分析元素的作文的深度侧面，艾尔原子的遗体都没在限制以内在 Si 层被检测(< 0.01 at.%) 使用的评估。比由退火准备了，，导致 Al 的结晶化生长获得的 poly-Si 材料才有更潜在的应用。" @default.
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- W1566149305 date "2006-01-01" @default.
- W1566149305 modified "2023-09-28" @default.
- W1566149305 title "Al-Induced Crystallization Growth of Si Films by Inductively Coupled Plasma Chemical Vapour Deposition" @default.
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