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- W1566173532 abstract "High-quality optical coating is a key technology for modern optics. Ion-assisted deposition technology was used to improve the vaporized coating in 1980's. The GIS (gridless ion source), which is an advanced plasma source for producing a high-quality optical coating in large area, can produce a large area uniformity>1000 mm(diameter), a high ion current density∽0.5 mA/cm^2, 20 eV∽200 eV energetic plasma ions and can activate reactive gas and film atoms. Now we have developed a GIS system. The GIS and the plasma ion-assisted deposition technology are investigated to achieve a high-quality optical coating. The GIS is a high power and high current source with a power of I kW∽7.5 kW, a current of 10 A∽70 A and an iondensity of 200μA/cm^2∽500μA/cm^2. Because of the special magnetic structure, the plasma-ion extraction efficiency has been improved to obtain a maximum ion density of 500μA/cm^2 in the medium power (∽4 kW) level. The GIS applied is of a special cathode structure, so that the GIS operation can be maintained under a rather low power and the lifetime of cathode will be extended. The GIS has been installed in the LPSX-1200 type box coating system. The coated TiO2, SiO2 films such as antireflective films with the system have the same performance reported by Leybold Co, 1992, along with a controllable refractive index and film structure." @default.
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- W1566173532 date "2004-01-01" @default.
- W1566173532 modified "2023-09-24" @default.
- W1566173532 title "The Gridless Plasma Ion Source （GIS） for Plasma Ion Assisted Optical Coating" @default.
- W1566173532 hasPublicationYear "2004" @default.
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