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- W1567131485 abstract "The production of self-organized surface nanopatterns by ion beam sputtering (IBS) at low (<10 keV) and intermediate (10–100 keV) energies has emerged in the last decade as a promising bottom-up nanostructuring tool. The technique is remarkably universal, being applicable to metals, semiconductors or insulators, and it enables large degree of control over the main pattern features with high throughput (it requires low process time and can be used over extended areas). However, there is a wide scatter in the experimental results obtained as a function of system type and process parameters. In parallel, diverse theoretical models have been developed that differ in their capabilities to reproduce such a wide range of experimental features. We provide an overview of the most recent studies on the production of nanoripple, nanohole and nanodot periodic nanostructures by IBS, with special attention to the comparison between experiments and (continuum) models, and with a focus on those issues that remain open or, at least, ambiguous. The pattern properties to be considered are those of potential increased technological importance, such as the variation of size, shape, distance and ordering of the nanostructures as a function of parameters such as ion energy, target temperature and sputtering time (i.e., fluence). Finally, reported and proposed applications of IBS nanopatterns are briefly presented showing, in this way, the high-potential functionality of IBS nanostructured surfaces." @default.
- W1567131485 created "2016-06-24" @default.
- W1567131485 creator A5029186501 @default.
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- W1567131485 creator A5050981762 @default.
- W1567131485 creator A5052336528 @default.
- W1567131485 creator A5056601909 @default.
- W1567131485 creator A5074624742 @default.
- W1567131485 date "2009-01-01" @default.
- W1567131485 modified "2023-09-26" @default.
- W1567131485 title "Self-Organized Surface Nanopatterning by Ion Beam Sputtering" @default.
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