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- W1567225713 abstract "The self-encapsulation kinetics of Ag/Al and Ag/Ti bilayers were studied as part of the effort to introduce Ag as an alternative metallization scheme for future ultra large-scale integrated (ULSI) technologies. The amount of segregated Al was monitored by Rutherford backscattering spectrometry (RBS), which included the use of nitrogen and oxygen elastic resonance reactions. Ion beam analysis was used to show both the transport of Al and Ti through the Ag layer, as well as the formation of Al oxynitride and TiN surface layers. These techniques were used to confirm the self-passivating characteristics of AlxOyNz diffusion barriers formed by Ag/Al and Ag/Ti bilayers annealed between 400–725 °C." @default.
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- W1567225713 date "2001-01-01" @default.
- W1567225713 modified "2023-09-23" @default.
- W1567225713 title "Ion beam characterization of advanced metallization for ULSI applications" @default.
- W1567225713 cites W1557649780 @default.
- W1567225713 doi "https://doi.org/10.1063/1.1395344" @default.
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