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- W1567953147 abstract "We report increase in the minority carrier lifetime τ eff by microwave irradiation using commercial microwave oven. N- and p-type crystalline silicon substrates coated with thermally grown SiO 2 layers were sandwiched by glass substrates and irradiated by microwave in a microwave oven at 700 W for 120 s. τ eff increased from initial values of 1.8×10−3 and 3.4×10−4 s to 2.6×10−3 and 8.4×10−4 s for n- and p-type samples, respectively. The high values of τ eff maintained for a long time above an one month. This method was applied to curing carrier recombination defects caused by Ar plasma irradiation. τ eff decreased to 9.5×10−6 and 2.6×10−6 s by Ar plasma treatment at 50 W f or 60 s for n- and p-type samples. They were markedly increased to 1.8×10−3 and 4.4×10−4 s by microwave irradiation at 700 W for 120 s, respectively. They maintained above one month." @default.
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- W1567953147 date "2012-07-04" @default.
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- W1567953147 title "Increase in minority carrier lifetime measured by microwave irradiation method" @default.
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