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• W1569653881 abstract "The resistance of Co–Al2O3–Si tunnel contacts for electrical spin injection from a ferromagnet into silicon is investigated. The contacts form a substantial Schottky barrier, 0.7eV, which plays a dominant role in the electronic transport. On Si with a low doping concentration (∼1015cm−3), the contact resistance is affected by the Al2O3 tunnel barrier only in the forward bias. In the reverse bias (the spin injection condition), the Schottky barrier results in a very high contact resistance, ∼102Ωm2. While the contact resistance is improved to ∼10−2Ωm2 using Si with a high doping concentration (∼5×1019cm−3), it is still about five to six orders of magnitude higher than the value needed for resistance matching to silicon." @default.
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• W1569653881 date "2006-04-15" @default.
• W1569653881 modified "2023-10-16" @default.
• W1569653881 title "Cobalt-Al2O3-silicon tunnel contacts for electrical spin injection into silicon" @default.
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• W1569653881 doi "https://doi.org/10.1063/1.2176317" @default.
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