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- W1570746857 abstract "The growth kinetics of silicon oxynitride (SiOx,:N) thin films grown on silicon in NzO ambient in a conventional oven, at high pressures and temperatures has been investigated. Starting from the Deal and Grove [1] model for silicon oxidation in O2, applied to this problem, we have found that the activation energy for the diffusion coefficient of the nitridating species (NO) is 2.54 eV. Similarly, the activation energy for the O2 diffusion coefficient through the oxynitride layer was also determined to be 3.67 eV. From these results we conclude that the NO molecules diffuse faster than O2 in the silicon oxynitride films, so that it explains why in spite of O2 being present in high proportion in the gas phase, the oxynitridation is limited by the kinetics of the NO molecules, causing a growth rate much less than for the oxidation of silicon in O2." @default.
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- W1570746857 date "2005-06-01" @default.
- W1570746857 modified "2023-09-27" @default.
- W1570746857 title "Role of 02 on the thermal oxynitridation of silicon in" @default.
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- W1570746857 doi "https://doi.org/10.1109/iceee.2004.1433894" @default.
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