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- W1570892253 abstract "We have investigated the incorporation of the group V elements N, P, and Sb into ZnO with the intention to produce p‐type ZnO. We used pulsed laser deposition for sample growth and sapphire as substrates. The free carrier concentration of as‐deposited ZnO:P decreases with increasing oxygen partial pressure. After rapid thermal annealing the carrier concentration of ZnO:P is about 1017 cm−3 independent of the carrier concentration before the annealing. This is explained by the diffusion of Al from the sapphire substrates into the thin films and can be strongly reduced by the insertion of a MgO buffer layer. As‐deposited codoped ZnO:(Ga,N) samples have lower carrier concentrations as nominally undoped samples if the Ga target concentration is in the ppm range. In photoluminescence measurements we found a donor‐acceptor pair related transition for a sample grown using a ZnO target containing 5% Li3N and for an annealed sample containing about 5% Sb." @default.
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- W1570892253 date "2005-01-01" @default.
- W1570892253 modified "2023-09-23" @default.
- W1570892253 title "Incorporation and electrical activity of group V acceptors in ZnO thin films" @default.
- W1570892253 doi "https://doi.org/10.1063/1.1994054" @default.
- W1570892253 hasPublicationYear "2005" @default.
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