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- W1572257295 abstract "In recent times, special merits of negative ion beams have been recognized in the context of novel materials science applications, and there is a plenty of room for further growth of the field. Various kinds of negative ion sources are currently available. Compact surface-plasma type sources, namely, Penning, planotron and semi-planotron sources, are discussed with special emphasis on the merits of these sources for applications in the area of microlithography, ion microscopy, and surface modifications. The potential of these sources for high-current applications, such as spallation neutron source, is also discussed." @default.
- W1572257295 created "2016-06-24" @default.
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- W1572257295 date "1998-01-01" @default.
- W1572257295 modified "2023-09-26" @default.
- W1572257295 title "Negative ion beams from compact surface plasma sources and their merits for new applications" @default.
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- W1572257295 doi "https://doi.org/10.1063/1.56366" @default.
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