FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W1577513763> ?p ?o ?g. }

• W1577513763 abstract "Optical (Photo) lithography has played a significant role in almost every aspects of modern micro-fabrication technology in the recent years. It has initiated transistor revolution in electronics and optical component developments in photonics. Advances in this field have allowed scientists to improve the resolution of the conventional photolithographic techniques, which is restricted by the diffraction limit [Okazaki, 1991]. To overcome this problem and to reduce the critical dimension, several solutions were introduced. New research suggests that we may be able to develop new low cost photolithographic technique beyond the diffraction limit. The minimum critical dimension (half-pitch resolution) achievable by photolithography (Optical projection lithography) is given by 1 / half pitch CD k NA λ − = , where λ is the incident source wavelength, NA is the numerical aperture of projection optics of the system and 1 k is a constant value as a indication of the effectiveness of the wavefront engineering techniques. To reduce the half-pitch resolution, critical dimension equation demands either to decrease the wavelength of illumination light source or to increase the numerical aperture of projection system. Or in short, fabrication of sub-100nm features generally imposes the requirement of shorter wavelength laser sources. In this context, the critical challenges that hinder the resolution enhancement approaches are (i) lack of availability of suitable ultra-short wavelength lasers, and (ii) the unavailability of suitable optics and materials such as photoresist for use at suitable wavelengths. Recently, techniques like extreme ultraviolet lithography (EUV) [Gwyn et al., 1998] and Xray lithography [Silverman, 1998] have been proposed for nanofabrication overcoming the diffraction limit. Here, the illumination wavelength is reduced to the extreme UV (smaller wavelength) to get smaller features. Another reported technique is the immersion lithography in which numerical aperture of the imaging system is increased by inserting high index fluids (prism or liquid) between last optical component and wafer surface [Wu, et al., 2007]. But this technique is either limited by air absorption or availability of high index fluids. Approaches such as electron-beam lithography can also be used to overcome diffraction limit, but these are serial process and cannot be used for high throughput [Chen et al., 2005]. Imprint lithography is another option to improve the resolution beyond the diffraction limit [McAlpine et al., 2003]. Nanometer scale features are possible by stamping a" @default.
• W1577513763 created "2016-06-24" @default.
• W1577513763 creator A5010034493 @default.
• W1577513763 creator A5014492011 @default.
• W1577513763 creator A5037859315 @default.
• W1577513763 date "2010-02-01" @default.
• W1577513763 modified "2023-10-03" @default.
• W1577513763 title "Metal Particle-Surface System for Plasmonic Lithography" @default.
• W1577513763 cites W1556801875 @default.
• W1577513763 cites W1572432597 @default.
• W1577513763 cites W1585185581 @default.
• W1577513763 cites W1649808901 @default.
• W1577513763 cites W1964632202 @default.
• W1577513763 cites W1965171843 @default.
• W1577513763 cites W1973785317 @default.
• W1577513763 cites W1980082708 @default.
• W1577513763 cites W1983942501 @default.
• W1577513763 cites W2018586229 @default.
• W1577513763 cites W2022817947 @default.
• W1577513763 cites W2022826415 @default.
• W1577513763 cites W2024486049 @default.
• W1577513763 cites W2047575605 @default.
• W1577513763 cites W2050761571 @default.
• W1577513763 cites W2061566538 @default.
• W1577513763 cites W2062179936 @default.
• W1577513763 cites W2071364015 @default.
• W1577513763 cites W2078569421 @default.
• W1577513763 cites W2091238804 @default.
• W1577513763 cites W2094748040 @default.
• W1577513763 cites W2101347012 @default.
• W1577513763 cites W2118203275 @default.
• W1577513763 cites W2123275076 @default.
• W1577513763 cites W2151262697 @default.
• W1577513763 cites W2152123194 @default.
• W1577513763 cites W2162123284 @default.
• W1577513763 cites W2169965425 @default.
• W1577513763 cites W2172282498 @default.
• W1577513763 cites W228547805 @default.
• W1577513763 cites W1990207942 @default.
• W1577513763 doi "https://doi.org/10.5772/8195" @default.
• W1577513763 hasPublicationYear "2010" @default.
• W1577513763 type Work @default.
• W1577513763 sameAs 1577513763 @default.
• W1577513763 citedByCount "0" @default.
• W1577513763 crossrefType "book-chapter" @default.
• W1577513763 hasAuthorship W1577513763A5010034493 @default.
• W1577513763 hasAuthorship W1577513763A5014492011 @default.
• W1577513763 hasAuthorship W1577513763A5037859315 @default.
• W1577513763 hasBestOaLocation W15775137631 @default.
• W1577513763 hasConcept C110879396 @default.
• W1577513763 hasConcept C111368507 @default.
• W1577513763 hasConcept C127313418 @default.
• W1577513763 hasConcept C171250308 @default.
• W1577513763 hasConcept C191897082 @default.
• W1577513763 hasConcept C192562407 @default.
• W1577513763 hasConcept C204223013 @default.
• W1577513763 hasConcept C2778517922 @default.
• W1577513763 hasConcept C49040817 @default.
• W1577513763 hasConcept C544153396 @default.
• W1577513763 hasConceptScore W1577513763C110879396 @default.
• W1577513763 hasConceptScore W1577513763C111368507 @default.
• W1577513763 hasConceptScore W1577513763C127313418 @default.
• W1577513763 hasConceptScore W1577513763C171250308 @default.
• W1577513763 hasConceptScore W1577513763C191897082 @default.
• W1577513763 hasConceptScore W1577513763C192562407 @default.
• W1577513763 hasConceptScore W1577513763C204223013 @default.
• W1577513763 hasConceptScore W1577513763C2778517922 @default.
• W1577513763 hasConceptScore W1577513763C49040817 @default.
• W1577513763 hasConceptScore W1577513763C544153396 @default.
• W1577513763 hasLocation W15775137631 @default.
• W1577513763 hasLocation W15775137632 @default.
• W1577513763 hasOpenAccess W1577513763 @default.
• W1577513763 hasPrimaryLocation W15775137631 @default.
• W1577513763 hasRelatedWork W2058676402 @default.
• W1577513763 hasRelatedWork W2075726529 @default.
• W1577513763 hasRelatedWork W2139871202 @default.
• W1577513763 hasRelatedWork W2292675962 @default.
• W1577513763 hasRelatedWork W2329285141 @default.
• W1577513763 hasRelatedWork W2399397734 @default.
• W1577513763 hasRelatedWork W2902546961 @default.
• W1577513763 hasRelatedWork W2912461306 @default.
• W1577513763 hasRelatedWork W2923768601 @default.
• W1577513763 hasRelatedWork W4313653414 @default.
• W1577513763 isParatext "false" @default.
• W1577513763 isRetracted "false" @default.
• W1577513763 magId "1577513763" @default.
• W1577513763 workType "book-chapter" @default.