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• W1580636144 abstract "Abstract This chapter concerns the state of development of electrochemical atomic layer epitaxy (EC‐ALE), the electrochemical analog of atomic layer epitaxy (ALE). EC‐ALE is being developed as a methodology for the electrodeposition of compound semiconductors with nanoscale control. ALE is based on the formation of compounds, one monolayer (ML) at a time, using surface‐limited reactions. An atomic layer of one element can be electrodeposited at a potential under that needed to deposit the element on itself, and this process is referred to as underpotential deposition (UPD). EC‐ALE is the use of UPD for the surface‐limited reactions in an ALE cycle. Electrodeposition is generally performed near room temperature, avoiding problems with interdiffusion and mismatched thermal expansion coefficients. This makes EC‐ALE a good candidate to form superlattices, where the compound deposited is modulated on the nanometer scale. This chapter describes the basics of the EC‐ALE cycle, the elements that have been used to form deposits, as well as the solutions, rinsing, and potential changes. It describes the hardware presently being used by this group and other research laboratories, the compounds that have been formed, and the development of deposition cycles for various compounds. It describes the status of device formation using EC‐ALE, and goes over some of the problems and issues involved in developing cycles and growing films. Finally, given that EC‐ALE is based on surface‐limited electrochemical reactions, studies of relevant electrodeposit surface chemistry are discussed." @default.
• W1580636144 created "2016-06-24" @default.
• W1580636144 creator A5004871549 @default.
• W1580636144 creator A5012998673 @default.
• W1580636144 creator A5038100254 @default.
• W1580636144 creator A5079836986 @default.
• W1580636144 creator A5090567107 @default.
• W1580636144 date "2002-08-27" @default.
• W1580636144 modified "2023-10-18" @default.
• W1580636144 title "Electrodeposition of Compound Semiconductors by Electrochemical Atomic Layer Epitaxy ( EC ‐ ALE )" @default.
• W1580636144 cites W1530128178 @default.
• W1580636144 cites W1550916887 @default.
• W1580636144 cites W1551250438 @default.
• W1580636144 cites W1569195673 @default.
• W1580636144 cites W1626540858 @default.
• W1580636144 cites W1769389345 @default.
• W1580636144 cites W1963559001 @default.
• W1580636144 cites W1963962385 @default.
• W1580636144 cites W1967644061 @default.
• W1580636144 cites W1969144214 @default.
• W1580636144 cites W1970092334 @default.
• W1580636144 cites W1971732102 @default.
• W1580636144 cites W1972160546 @default.
• W1580636144 cites W1973483846 @default.
• W1580636144 cites W1973872836 @default.
• W1580636144 cites W1973950254 @default.
• W1580636144 cites W1977632674 @default.
• W1580636144 cites W1978917102 @default.
• W1580636144 cites W1982206153 @default.
• W1580636144 cites W1983390861 @default.
• W1580636144 cites W1983671469 @default.
• W1580636144 cites W1989051268 @default.
• W1580636144 cites W1989607627 @default.
• W1580636144 cites W1990475267 @default.
• W1580636144 cites W1993262035 @default.
• W1580636144 cites W1994588613 @default.
• W1580636144 cites W1997700436 @default.
• W1580636144 cites W1999757555 @default.
• W1580636144 cites W2000295247 @default.
• W1580636144 cites W2001623692 @default.
• W1580636144 cites W2004140389 @default.
• W1580636144 cites W2004677208 @default.
• W1580636144 cites W2005290259 @default.
• W1580636144 cites W2012228825 @default.
• W1580636144 cites W2012374367 @default.
• W1580636144 cites W2013741284 @default.
• W1580636144 cites W2016624116 @default.
• W1580636144 cites W2016920031 @default.
• W1580636144 cites W2016924888 @default.
• W1580636144 cites W2016998115 @default.
• W1580636144 cites W2021583450 @default.
• W1580636144 cites W2022527388 @default.
• W1580636144 cites W2023213095 @default.
• W1580636144 cites W2023303235 @default.
• W1580636144 cites W2024331918 @default.
• W1580636144 cites W2025301197 @default.
• W1580636144 cites W2026577311 @default.
• W1580636144 cites W2027228089 @default.
• W1580636144 cites W2028307181 @default.
• W1580636144 cites W2028832119 @default.
• W1580636144 cites W2034089882 @default.
• W1580636144 cites W2034628415 @default.
• W1580636144 cites W2038166115 @default.
• W1580636144 cites W2039903295 @default.
• W1580636144 cites W2042513077 @default.
• W1580636144 cites W2043674678 @default.
• W1580636144 cites W2043707146 @default.
• W1580636144 cites W2046554444 @default.
• W1580636144 cites W2050622358 @default.
• W1580636144 cites W2052726420 @default.
• W1580636144 cites W2053749039 @default.
• W1580636144 cites W2058161419 @default.
• W1580636144 cites W2060197840 @default.
• W1580636144 cites W2061144981 @default.
• W1580636144 cites W2062421578 @default.
• W1580636144 cites W2063165625 @default.
• W1580636144 cites W2064299068 @default.
• W1580636144 cites W2064739029 @default.
• W1580636144 cites W2071088374 @default.
• W1580636144 cites W2071238729 @default.
• W1580636144 cites W2073738410 @default.
• W1580636144 cites W2073868432 @default.
• W1580636144 cites W2074343984 @default.
• W1580636144 cites W2074996412 @default.
• W1580636144 cites W2075046523 @default.
• W1580636144 cites W2076032607 @default.
• W1580636144 cites W2078108037 @default.
• W1580636144 cites W2078127616 @default.
• W1580636144 cites W2085834015 @default.
• W1580636144 cites W2085930358 @default.
• W1580636144 cites W2086863476 @default.
• W1580636144 cites W2086867413 @default.
• W1580636144 cites W2087671554 @default.
• W1580636144 cites W2088621400 @default.
• W1580636144 cites W2089230163 @default.
• W1580636144 cites W2089841765 @default.
• W1580636144 cites W2090103557 @default.
• W1580636144 cites W2091385478 @default.
• W1580636144 cites W2092597135 @default.
• W1580636144 cites W2092895126 @default.

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