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• W1589267155 abstract "This chapter contains sections titled: Introduction High-k Oxide/Si Interfaces Metal Gate/High-k Dielectric Interfaces Chemical Tuning of Band Alignments for Metal Gate/High-k Oxide Interfaces Summary and Discussion References" @default.
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• W1589267155 date "2012-08-22" @default.
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• W1589267155 title "Interface Engineering in the High-k Dielectric Gate Stacks" @default.
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• W1589267155 doi "https://doi.org/10.1002/9783527646340.ch9" @default.
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