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- W1592028115 abstract "GaN-based ridge waveguides with very smooth and vertical sidewalls are fabricated with combined inductively coupled plasma (ICP) etching and chemical etching. Reduction in scattering loss is estimated to be 2 dB/mm at 1.55 μm." @default.
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- W1592028115 date "2015-01-01" @default.
- W1592028115 modified "2023-09-27" @default.
- W1592028115 title "GaN-based Ridge Waveguides with Very Smooth and Vertical Sidewalls by ICP Dry Etching and Chemical Etching" @default.
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- W1592028115 doi "https://doi.org/10.1364/cleo_at.2015.jth2a.24" @default.
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