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- W159884532 abstract "Sapphire ({alpha}-Al{sub 2}O{sub 3}) crystals were implanted with 3.8 MeV Fe{sup 2+} ions to fluences of 0.5 {times} 10{sup 16} and 2 {times} 10{sup 16} cm{sup {minus} 2}. The sample face was perpendicular to the c-axis. The radiation damage produced by the implantation was investigated using optical and electron paramagnetic resonance (EPR) techniques. The former encompassed optical absorption and luminescene. The predominant defect detected optically was the oxygen vacancy with two electrons (F center), identified by an absorption peak at 6.2 eV ({approximately}200 nm). The paramagnetic oxygen vacancy with one electron (F{sup plus} center) absorbs at 4.8 eV ({approximately}260 nm) and was identified by EPR. Divacancies in various charge states were present in much lower concentrations and could not be unambiguously identified by optical absorption. Instead, they were detected by the highly sensitive luminescence measurements. Upon isochronal annealing between 500 and 1200 K, the concentration of the F center decreased monotonically. No evidence of the F{sup +}-center was found after annealing at 800 K. On the other hand, the concentration of the higher order defects initially increased, presumably at the expense of the oxygen vacancies, and subsequently also decreased. 12 refs., 5 figs., 1 tab." @default.
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- W159884532 date "1990-01-01" @default.
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- W159884532 title "Radiation damage in Al sub 2 O sub 3 crystals implanted with 3. 8 MeV Fe sup 2+ ions" @default.
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