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- W1602232133 abstract "In this paper, a fully integrated CMOS and high voltage compatible RF MEMS (radio frequency microelectromechanical systems) technology is proposed and demonstrated for the first time. The high performance RF MEMS switch, high voltage MOSFET, and CMOS devices are all obtained using a simple process. The fabricated high voltage device has a breakdown voltage of over 35V. The MEMS capacitive switch fabricated on a high resistivity SOI substrate and with high-k dielectric (HfO/sub 2/) exhibits a low insertion loss (0.14dB at 5GHz) and a good isolation (9.5dB at 5GHz). This technology demonstrates the feasibility of building fully integrated RF systems for wireless communication applications." @default.
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- W1602232133 date "2005-04-19" @default.
- W1602232133 modified "2023-09-25" @default.
- W1602232133 title "A fully integrated CMOS and high voltage compatible RF MEMS technology" @default.
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- W1602232133 doi "https://doi.org/10.1109/iedm.2004.1419057" @default.
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