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- W1608739717 abstract "The Al2O3 films with a thickness of about 100nm synthesized by spin coating and thermally treated is applied for field-induced surface passivation of p-type crystalline silicon. The level of surface passivation is determined bytechniques based on photoconductance. An effective surface recombination velocity below 100 cm/s is obtained on 10Ω·cm p-type c-Si wafers (Cz Si). A high density of negative fixed charges in the order of 1012 cm?2 is detected in the Al2O3 films and its impact on the level of surface passivation is demonstrated experimentally. Furthermore, a comparison between the surface passivation achieved for thermal SiO2 and plasma enhanced chemical vapor deposition SiNx:H films on the same c-Si is presented. The high negative fixed charge density explains the excellent passivation of p-type c-Si by Al2O3." @default.
- W1608739717 created "2016-06-24" @default.
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- W1608739717 date "2009-01-01" @default.
- W1608739717 modified "2023-09-24" @default.
- W1608739717 title "Excellent Passivation of p-Type Si Surface by the Sol-Gel Al2O3 Films" @default.
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