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- W1615673902 abstract "New measurements have been made of rate constants for electron attachment to c-C4F8 (octafluorocyclobutane) and thermal electron detachment from the parent anion, c-C4F8−, over the temperature range 298–400 K in 133 Pa of He gas in a flowing-afterglow Langmuir-probe apparatus. From these data the electron affinity for c-C4F8 was determined, EA(c-C4F8)=0.63±0.05 eV. The motivation was to resolve a discrepancy between our earlier EA estimate and a higher value (EA=1.05±0.10 eV) reported from a recent experiment of Hiraoka et al. [J. Chem. Phys. 116, 7574 (2002)]. The electron attachment rate constant is 9.3±3.0×10−9 cm3 s−1 at 298 K. The electron detachment rate constant is negligible at room temperature but climbs to 1945±680 s−1 at 400 K. G3(MP2) calculations were carried out for the neutral (D2d, 1A1) and anion (D4h, 2A2u) and yielded EA(c-C4F8−)=0.595 eV. Bond energies were also calculated for loss of F from c-C4F8 and loss of F or F− from c-C4F8−. From these, dissociative electron attachment is found to be endothermic by at least 1.55 eV." @default.
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- W1615673902 date "2004-04-15" @default.
- W1615673902 modified "2023-09-27" @default.
- W1615673902 title "Electron attachment and detachment and the electron affinity of cyclo-C4F8" @default.
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- W1615673902 doi "https://doi.org/10.1063/1.1683082" @default.
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