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• W1618720912 abstract "The crystallization behaviors of and nitrogen-doped films, deposited by dc magnetron sputtering, were investigated using the in situ resistance measurement, X-ray diffractometry, and transmission electron microscopy (TEM). The kinetic constants were estimated using the classical Johnson–Mehl–Avrami–Kolmogrov model from the resistance measurement of and nitrogen-doped films. The nitrogen-doped showed a one-step process with the Avrami constant of 1, while the thin film showed a two-step transformation with of 3.6 and 1. The cross-sectional TEM revealed that the crystallizations were concentrated to the regions of 20–30 nm near the top surfaces rather than occurring throughout the films of and nitrogen-doped films. The annealed showed continuous crystalline films with 20 nm grains at the surface in conjunction with the saturation of the sheet resistance, while the annealed nitrogen-doped showed nanocrystalline phases with 5 nm grains near the surface with a continuous decrease in sheet resistance. The crystallization of nitrogen-doped was observed to be a nucleation-dominant process, while that of was a growth-dominant process." @default.
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• W1618720912 date "2010-01-01" @default.
• W1618720912 modified "2023-09-27" @default.
• W1618720912 title "Effect of Doped Nitrogen on the Crystallization Behaviors of Ge[sub 2]Sb[sub 2]Te[sub 5]" @default.
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• W1618720912 doi "https://doi.org/10.1149/1.3321759" @default.
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