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- W1618872776 abstract "We have developed a method to determine the Pore Size Distribution (PSD) of porous low‐k dielectric materials. The method is based on a modified version of Small Angle X‐ray Scattering (SAXS). We fix the incident X‐ray angle such that it is a larger angle than the total reflection critical angle for the low‐k dielectric material, and a smaller angle than the critical angle for the substrate material. The scattered X‐rays are then collected using a two dimensional position sensitive X‐ray detector. Measurements were collected on a set of porous SiLK™, organic, low‐k dielectric, films. The results are compared with Transmission SAXS (T‐SAXS) measurements collected using Synchrotron Radiation (SR) as the X‐ray source." @default.
- W1618872776 created "2016-06-24" @default.
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- W1618872776 date "2003-01-01" @default.
- W1618872776 modified "2023-09-25" @default.
- W1618872776 title "Pore Size Distribution Measurement of Porous Low-k Dielectrics Using TR-SAXS" @default.
- W1618872776 doi "https://doi.org/10.1063/1.1622525" @default.
- W1618872776 hasPublicationYear "2003" @default.
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