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- W1619107881 abstract "Chemical force microscopy, a variant of atomic force microscopy, is being developed to image the spatial distributions of chemical species at different stages of the lithography process. By imaging the chemical changes that occur in the resist during the lithographic process we gain insight into the fundamental physical and chemical processes that determine the fidelity of pattern replication in the resist. We have examined several stages of the lithography process including the homogeneity of resist after spin casting, latent image formation, and segregation during development to look for possible contributions to line width roughness in lithographic patterns. We have obtained good chemical contrast in a variety of systems that provide insight into the underlying fundamentals. We also discuss work to develop the metro logical underpinnings of chemical force microscopy." @default.
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- W1619107881 date "2007-01-01" @default.
- W1619107881 modified "2023-09-24" @default.
- W1619107881 title "Hunting the Origins of Line Width Roughness with Chemical Force Microscopy" @default.
- W1619107881 doi "https://doi.org/10.1063/1.2799409" @default.
- W1619107881 hasPublicationYear "2007" @default.
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