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- W1625194567 abstract "The polarization of light scattered by oxide films thermally grown on photolithographically-generated microrough silicon was measured as functions of scattering angle. Using the predictions of first-order vector perturbation theory for scattering from interfacial roughness to interpret the results, the roughness of each interface and the correlation function between the two interfaces can be determined. The results show the spatial frequency dependence of the SiO2/Si interface smoothening. The impact of these results on the inspection of silicon wafers with dielectric films is discussed." @default.
- W1625194567 created "2016-06-24" @default.
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- W1625194567 date "2001-01-01" @default.
- W1625194567 modified "2023-09-27" @default.
- W1625194567 title "Characterizing interfacial roughness by light scattering ellipsometry" @default.
- W1625194567 cites W1555713064 @default.
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- W1625194567 doi "https://doi.org/10.1063/1.1354395" @default.
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