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- W1625203492 abstract "Considerable gains in implanter utilization efficiency can be attained with in‐situ cleaning of deposited material, particularly in and around the ion source. Different methods of in‐situ cleaning are described, and we discuss the relative merits of several chemical reagents. We introduce XeF2, a new and promising reagent for in‐situ cleaning and present some preliminary experiments showing its ability to etch dopant materials. We also show that in some cases etching by XeF2 can be selective with respect to ion source construction materials such as tungsten." @default.
- W1625203492 created "2016-06-24" @default.
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- W1625203492 date "2006-01-01" @default.
- W1625203492 modified "2023-09-25" @default.
- W1625203492 title "The Development of In-Situ Ion Implant Cleaning Processes" @default.
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- W1625203492 doi "https://doi.org/10.1063/1.2401560" @default.
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