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• W1631398168 abstract "Gd2O3 and Gd-doped HfO2 films were deposited on p-type silicon substrates in a reducing atmosphere. Gd 4f photoexcitation peaks at roughly 7 and 5 eV below the valence band maximum have been identified using the resonant photoemission of Gd2O3 and Gd-doped HfO2 films, respectively. In the case of Gd2O3, strong hybridization with the O 2p band is demonstrated, and there is evidence that the Gd 4f weighted band exhibits dispersion in the bulk band structure. The rectifying (diode-like) properties of Gd-doped HfO2–silicon and Gd2O3–silicon heterojunctions are demonstrated." @default.
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• W1631398168 date "2009-01-08" @default.
• W1631398168 modified "2023-10-18" @default.
• W1631398168 title "Comparison of n-type Gd₂O₃and Gd-doped HfO₂" @default.
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• W1631398168 doi "https://doi.org/10.1088/0953-8984/21/4/045602" @default.
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