Matches in SemOpenAlex for { <https://semopenalex.org/work/W163424372> ?p ?o ?g. }
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with 100 items per page.
- W163424372 endingPage "24" @default.
- W163424372 startingPage "1" @default.
- W163424372 abstract "This chapter presents the history of plasma processing. Plasma technology or dry etching technology is one of the newer requirements in semiconductor wafer manufacturing that has seen significant implementation. The ashing of photoresists was the initial process that was implemented in various manufacturing lines. Thin-film plasma deposition was recognized very early, before plasma etching needs, as a new source of low-temperature dielectric materials for passivation of integrated circuit surfaces. Plasma processing, and particularly plasma etching, was beginning to be recognized because of the emergence of n-channel silicon gate MOS (NMOS) technology; NMOS was the primary technology that produced dynamic random access memories and logic circuits such as microprocessors. Plasma processing was originally introduced without requirements for stringent dimensional control on the patterning of silicon nitride and polycrystalline silicon. It was considered as a direct replacement for wet etching." @default.
- W163424372 created "2016-06-24" @default.
- W163424372 creator A5077588294 @default.
- W163424372 date "1984-01-01" @default.
- W163424372 modified "2023-09-23" @default.
- W163424372 title "The History of Plasma Processing" @default.
- W163424372 doi "https://doi.org/10.1016/b978-0-12-234108-3.50006-6" @default.
- W163424372 hasPublicationYear "1984" @default.
- W163424372 type Work @default.
- W163424372 sameAs 163424372 @default.
- W163424372 citedByCount "6" @default.
- W163424372 countsByYear W1634243722013 @default.
- W163424372 countsByYear W1634243722015 @default.
- W163424372 countsByYear W1634243722019 @default.
- W163424372 crossrefType "book-chapter" @default.
- W163424372 hasAuthorship W163424372A5077588294 @default.
- W163424372 hasConcept C100460472 @default.
- W163424372 hasConcept C107187091 @default.
- W163424372 hasConcept C119599485 @default.
- W163424372 hasConcept C121332964 @default.
- W163424372 hasConcept C127413603 @default.
- W163424372 hasConcept C1291036 @default.
- W163424372 hasConcept C130472188 @default.
- W163424372 hasConcept C145738678 @default.
- W163424372 hasConcept C160671074 @default.
- W163424372 hasConcept C165801399 @default.
- W163424372 hasConcept C171250308 @default.
- W163424372 hasConcept C172385210 @default.
- W163424372 hasConcept C192562407 @default.
- W163424372 hasConcept C197162436 @default.
- W163424372 hasConcept C24326235 @default.
- W163424372 hasConcept C2777431650 @default.
- W163424372 hasConcept C2779227376 @default.
- W163424372 hasConcept C2780565262 @default.
- W163424372 hasConcept C33574316 @default.
- W163424372 hasConcept C49040817 @default.
- W163424372 hasConcept C544956773 @default.
- W163424372 hasConcept C62520636 @default.
- W163424372 hasConcept C82706917 @default.
- W163424372 hasConcept C87359718 @default.
- W163424372 hasConcept C99293441 @default.
- W163424372 hasConceptScore W163424372C100460472 @default.
- W163424372 hasConceptScore W163424372C107187091 @default.
- W163424372 hasConceptScore W163424372C119599485 @default.
- W163424372 hasConceptScore W163424372C121332964 @default.
- W163424372 hasConceptScore W163424372C127413603 @default.
- W163424372 hasConceptScore W163424372C1291036 @default.
- W163424372 hasConceptScore W163424372C130472188 @default.
- W163424372 hasConceptScore W163424372C145738678 @default.
- W163424372 hasConceptScore W163424372C160671074 @default.
- W163424372 hasConceptScore W163424372C165801399 @default.
- W163424372 hasConceptScore W163424372C171250308 @default.
- W163424372 hasConceptScore W163424372C172385210 @default.
- W163424372 hasConceptScore W163424372C192562407 @default.
- W163424372 hasConceptScore W163424372C197162436 @default.
- W163424372 hasConceptScore W163424372C24326235 @default.
- W163424372 hasConceptScore W163424372C2777431650 @default.
- W163424372 hasConceptScore W163424372C2779227376 @default.
- W163424372 hasConceptScore W163424372C2780565262 @default.
- W163424372 hasConceptScore W163424372C33574316 @default.
- W163424372 hasConceptScore W163424372C49040817 @default.
- W163424372 hasConceptScore W163424372C544956773 @default.
- W163424372 hasConceptScore W163424372C62520636 @default.
- W163424372 hasConceptScore W163424372C82706917 @default.
- W163424372 hasConceptScore W163424372C87359718 @default.
- W163424372 hasConceptScore W163424372C99293441 @default.
- W163424372 hasLocation W1634243721 @default.
- W163424372 hasOpenAccess W163424372 @default.
- W163424372 hasPrimaryLocation W1634243721 @default.
- W163424372 hasRelatedWork W1547968484 @default.
- W163424372 hasRelatedWork W163424372 @default.
- W163424372 hasRelatedWork W1965037993 @default.
- W163424372 hasRelatedWork W1990893538 @default.
- W163424372 hasRelatedWork W2025378938 @default.
- W163424372 hasRelatedWork W2167011693 @default.
- W163424372 hasRelatedWork W2329682232 @default.
- W163424372 hasRelatedWork W2356992382 @default.
- W163424372 hasRelatedWork W3197419717 @default.
- W163424372 hasRelatedWork W820049253 @default.
- W163424372 isParatext "false" @default.
- W163424372 isRetracted "false" @default.
- W163424372 magId "163424372" @default.
- W163424372 workType "book-chapter" @default.