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- W1636792386 abstract "Electron traps in n -Al 0.2 Ga 0.8 As layers grown by molecular beam epitaxy (MBE) have been studied by deep level transient spectroscopy. When compared among the layers grown sequentially, the concentrations of the two dominant trap levels, ME5 (activation energy 0.63 eV) and ME6 (0.71 eV), are found to decrease markedly with the growth run number. The trap concentrations also depend sensitively on the choice of arsenic source material. These results show that the traps are closely associated with volatile impurities in arsenic materials." @default.
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- W1636792386 date "1985-10-01" @default.
- W1636792386 modified "2023-09-27" @default.
- W1636792386 title "Effect of Arsenic Source on Electron Trap Concentrations in MBE-Grown Al<sub>0.2</sub>Ga<sub>0.8</sub>As" @default.
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- W1636792386 doi "https://doi.org/10.1143/jjap.24.1324" @default.
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