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- W1637694838 abstract "Abstract : Ion plating is a physical vapor deposition process which uses a plasma to modify the microstructure/microchemistry of thin film coatings. This research has directly shown that processing variables such as plasma energy/density; substrate temperature; deposition rate; and substrate surface chemistry directly effect the deposited film microstructure and chemistry. This processing technique allows mechanically strong/chemically graded interface layers to be produced between dissimilar material. Film adhesion with this process is correspondingly excellent. This process was used to produce corrosion and wear resistant hard coatings." @default.
- W1637694838 created "2016-06-24" @default.
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- W1637694838 date "1987-08-04" @default.
- W1637694838 modified "2023-09-26" @default.
- W1637694838 title "Ion Plating: Fundamental Processing Studies and Synthesis of High Performance Coatings." @default.
- W1637694838 doi "https://doi.org/10.21236/ada184766" @default.
- W1637694838 hasPublicationYear "1987" @default.
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