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- W1640361892 abstract "We have developed a technique for fabricating submicron GaAs micromechanical cantilevers into which lithographically patterned samples grown by molecular beam epitaxy or evaporative deposition are integrated. The torque sensitivity of the 100-nm-thick cantilevers makes them ideal for torsional magnetometry of nanometer-scale, anisotropic samples. We present measurements on samples of the ferromagnetic semiconductor Ga1−xMnxAs at temperatures from 350 mK to 65 K and in fields from 0 to 8 T. By measuring the shift in the resonant frequency of the cantilevers, we demonstrate a moment sensitivity of 3×106 μB at 0.1 T, an improvement of nearly five orders of magnitude upon existing torsional magnetometers." @default.
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- W1640361892 date "1999-08-23" @default.
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- W1640361892 title "Integrated micromechanical cantilever magnetometry of Ga1−xMnxAs" @default.
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- W1640361892 doi "https://doi.org/10.1063/1.124622" @default.
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